Monitoring in Thin Film Production

PhotonicNet & the Research Center for Surface Technology present the international Workshop Monitoring in Thin Film Production in cooperation with the Lomonossow University in Moscow.

Program:

Welcome
Detlev Ristau
Laser Zentrum Hannover e.V., Hannover, Germany

Session I: Fundamentals

Monitoring and Control of Optical Deposition Processes
Henrik Ehlers
Laser Zentrum Hannover e.V., Hannover, Germany

Design and Optical Monitoring
Alexander Tikhonravov
Lomonossow University, Moscow

Optical Monitoring in Modern Deposition Processes
N.N.
Bühler Group, Leybold Optics

Session II: Applications

Filter Systems
Marc Lappschieß
Optic Balzers Jena GmbH, Jena

Recent Developments
N.N.

Optical Monitoring in IBS
Kai Starke
CEC Cutting Edge Coatings GmbH, Hannover, Germany

Session III: Applications

Chirped Mirrors
Vladimir Pervak
Ludwig-Maximilians-University, Munich

Prospects for the enhancement of PIAD processes by monitoring of optical thickness and plasma parameters
Jens Harhausen1, Rüdiger Foest1, Margarita Baeva1, Detlef Loffhagen1, Olaf Stenzel2, Steffen Wilbrandt2, Christian Franke2, Norbert Kaiser2, and Ralf P. Brinkmann3
1
Leibniz-Institute for Plasma Science and Technology, INP Greifswald, Greifswald, Germany
2Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena, Germany
3
Department of Electrical Engineering and Information Sciences, Ruhr-University Bochum, Bochum, Germany

Session IV: Advanced Monitoring Concepts

Optical Monitoring: New Approaches
Sebastian Schlichting
Laser Zentrum Hannover e.V., Hannover, Germany

Automatic generation of monochromatic monitoring spreadsheets
Michael Trubetskov1, Tatiana Amotchkina1, Alexander Tikhonravov2
1 Max-Planck Institute of Quantum Optics, Garching
2 Lomonossow University, Moscow

Final remarks

Lab Tour LZH e.V.

« Zurück zur Übersicht

Logo PhotonicNet GmbH

Datum
20.02.2018    09:30 Uhr - 17:30 Uhr

Stadt
Hannover

Veranstaltungsort
LZH e.V., Hollerithallee 8, 30419 Hannover

Referenten
Detlev Ristau, Laser Zentrum Hannover e.V., Hannover, Germany
Henrik Ehlers, Laser Zentrum Hannover e.V., Hannover, Germany
Alexander Tikhonravov, Lomonossow University, Moscow
Marc Lappschieß, Optic Balzers Jena GmbH, Jena
Kai Starke, CEC Cutting Edge Coatings GmbH, Hannover, Germany
Vladimir Pervak, Ludwig-Maximilians-University, Munich
Jens Harhausen, Leibniz-Institute for Plasma Science and Technology, INP Greifswald, Greifswald, Germany
Rüdiger Foest, Leibniz-Institute for Plasma Science and Technology, INP Greifswald, Greifswald, Germany
Margarita Baeva, Leibniz-Institute for Plasma Science and Technology, INP Greifswald, Greifswald, Germany
Detlef Loffhagen, Leibniz-Institute for Plasma Science and Technology, INP Greifswald, Greifswald, Germany
Olaf Stenzel, Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena, Germany
Steffen Wilbrandt, Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena, Germany
Christian Franke, Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena, Germany
Norbert Kaiser2Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena, Germany
Ralf P. Brinkmann, Ruhr-University, Bochum, Germany
Sebastian Schlichting, Laser Zentrum Hannover e.V., Hannover, Germany
Michael Trubetskov, Max-Planck Institute of Quantum Optics, Garching
Tatiana Amotchkina, Max-Planck Institute of Quantum Optics, Garching

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